Strasser, Patrick; Wüest, Robert; Robin, Franck; Erni, Daniel; Jäckel, Heinz:
Detailed analysis of the influence of an ICP-RIE process on the hole depth and shape for photonic crystals in InP/InGaAsP
In: Journal of Vacuum Science and Technology B : Nanotechnology and Microelectronics, Vol. 25 (2007), No. 2, pp. 387 - 393
2007article/chapter in journal
Electrical Engineering and Information TechnologyFaculty of Engineering
Title in English:
Detailed analysis of the influence of an ICP-RIE process on the hole depth and shape for photonic crystals in InP/InGaAsP
Author:
Strasser, Patrick;Wüest, Robert;Robin, Franck;Erni, DanielUDE
GND
1175897205
LSF ID
47126
ORCID
0000-0002-1467-6373ORCID iD
Other
connected with university
;Jäckel, Heinz
Year of publication:
2007
DOI
10.1116/1.2712198
Language of text:
English
Appears in
Journal of Vacuum Science and Technology B : Nanotechnology and Microelectronics
Title in English (abbreviated):
JVST
Place of publication:
New York
in:
Vol. 25 (2007), No. 2, pp. 387 - 393
ISSN
2166-2746 Show availability online & print
ISSN
0734-211X Show availability online & print
ISSN
1071-1023 Show availability online & print
ZDB ID
3117333-0
Library shelfmark:
67 Z 23