Stella, Kevin; Bürstel, Damian; Hasselbrink, Eckart; Diesing, Detlef:
Thin Tantalum Films on Crystalline Silicon - A Metallic Glass
In: Physica Status Solidi: Rapid Research Letters, Band 5 (2011), S. 68 - 70
2011Artikel/Aufsatz in Zeitschrift
Chemie
Titel:
Thin Tantalum Films on Crystalline Silicon - A Metallic Glass
Autor*in:
Stella, KevinUDE
LSF ID
49841
Sonstiges
der Hochschule zugeordnete*r Autor*in
;
Bürstel, DamianUDE
LSF ID
52512
Sonstiges
der Hochschule zugeordnete*r Autor*in
;
Hasselbrink, EckartUDE
GND
1162945346
LSF ID
11041
ORCID
0000-0002-9374-2868ORCID iD
Sonstiges
der Hochschule zugeordnete*r Autor*in
;
Diesing, DetlefUDE
LSF ID
11102
ORCID
0000-0002-5587-2557ORCID iD
Sonstiges
der Hochschule zugeordnete*r Autor*in
Erscheinungsjahr:
2011

Abstract:

Thin amorphous tantalum films are prepared on Si(111) substrates in a metallic glassy state. The amorphous monoatomic state of the film is characterized by X-ray diffraction studies. The glassy state leads to a negative temperature coefficient of the resistivity (TCR) for low sample temperatures <200 K which is attributed to incipient localization. Above 200 K a positive TCR is observed as expected for a normal Boltzmann transport regime. Upon heating the Si substrate to 1200 K TaSi2 is formed out of the amorphous tantalum film and the silicon substrate. The TaSi2 layer is crystalline as evident from X-ray diffraction data.