Stable tungsten disilicide contacts for surface and thin film resistivity measurements
In: Journal of Vacuum Science and Technology (JVST) B : Nanotechnology and Microelectronics, Vol. 27 (2009), No. 1, p. 180
2009article/chapter in journal
Physics (incl. Astronomy)Faculty of Physics » Experimental PhysicsScientific institutes » Center for Nanointegration Duisburg-Essen (CENIDE)
Related: 1 publication(s)
Title in English:
Stable tungsten disilicide contacts for surface and thin film resistivity measurements
Author:
Jnawali, GirirajUDE
- LSF ID
- 10417
- ORCID
- 0000-0003-0954-8614
- Other
- connected with university
- LSF ID
- 48700
- ORCID
- 0000-0002-5878-2012
- Other
- connected with university
- LSF ID
- 48960
- Other
- connected with university
- LSF ID
- 51046
- Other
- connected with university
- GND
- 1201039908
- LSF ID
- 10366
- ORCID
- 0000-0003-0324-3457
- Other
- connected with university
Year of publication:
2009
Language of text:
English