Thin Tantalum Films on Crystalline Silicon - A Metallic Glass
In: Physica Status Solidi: Rapid Research Letters, Band 5 (2011), S. 68 - 70
2011Artikel/Aufsatz in Zeitschrift
Chemie
Titel:
Thin Tantalum Films on Crystalline Silicon - A Metallic Glass
Autor*in:
Stella, KevinUDE
- LSF ID
- 49841
- Sonstiges
- der Hochschule zugeordnete*r Autor*in
- LSF ID
- 52512
- Sonstiges
- der Hochschule zugeordnete*r Autor*in
- GND
- 1162945346
- LSF ID
- 11041
- ORCID
- 0000-0002-9374-2868
- Sonstiges
- der Hochschule zugeordnete*r Autor*in
- LSF ID
- 11102
- ORCID
- 0000-0002-5587-2557
- Sonstiges
- der Hochschule zugeordnete*r Autor*in
Erscheinungsjahr:
2011
Abstract:
Thin amorphous tantalum films are prepared on Si(111) substrates in a metallic glassy state. The amorphous monoatomic state of the film is characterized by X-ray diffraction studies. The glassy state leads to a negative temperature coefficient of the resistivity (TCR) for low sample temperatures <200 K which is attributed to incipient localization. Above 200 K a positive TCR is observed as expected for a normal Boltzmann transport regime. Upon heating the Si substrate to 1200 K TaSi2 is formed out of the amorphous tantalum film and the silicon substrate. The TaSi2 layer is crystalline as evident from X-ray diffraction data.