Hopster, Johannes; Diesing, Detlef; Wucher, Andreas; Schleberger, Marika:
Comparison of ion beam and electron beam induced transport of hot charge carriers in metal-insulator-metal junctions
In: Ion beams : new applications from mesoscale to nanoscale - 2011 MRS Spring Meeting, April 25 - 29, San Francisco, California, USA - New York: Cambridge Univ. Press, 2011 - (Materials Research Society symposium proceedings ; 1354)
2011book article/chapter in Proceedings
ChemistryFaculty of PhysicsFaculty of Chemistry » Physikalische Chemie
Title:
Comparison of ion beam and electron beam induced transport of hot charge carriers in metal-insulator-metal junctions
Author:
Hopster, JohannesUDE
LSF ID
51552
Other
connected with university
;Diesing, DetlefUDE
LSF ID
11102
ORCID
0000-0002-5587-2557ORCID iD
Other
connected with university
;Wucher, AndreasUDE
GND
1247767086
LSF ID
10403
ORCID
0000-0002-9244-9491ORCID iD
Other
connected with university
;Schleberger, MarikaUDE
GND
1227773390
LSF ID
10367
ORCID
0000-0002-5785-1186ORCID iD
Other
connected with university
DOI
10.1557/opl.2011.1083
Scopus ID
84875462898
Appears in
Ion beams : new applications from mesoscale to nanoscale
Conference
2011 MRS Spring Meeting, April 25 - 29, San Francisco, California, USA
Place of publication:
New York
Publisher:
Cambridge Univ. Press
Year of publication:
2011
ISBN
978-160511-331-9
In Series
Materials Research Society symposium proceedings
in:
Vol. 1354