Photochemical routes to silicon epitaxy
In: Journal of Vacuum Science and Technology A : Vacuum, Surfaces, and Films, Vol. 15 (1997), No. 3, pp. 1135 - 1139
1997article/chapter in journal
ChemistryFaculty of Chemistry » Physikalische Chemie
Title in English:
Photochemical routes to silicon epitaxy
Author:
Dippel, Olaf;Wright, Steven;Hasselbrink, EckartUDE
- GND
- 1162945346
- LSF ID
- 11041
- ORCID
- 0000-0002-9374-2868
- Other
- connected with university
Year of publication:
1997
DOI
Scopus ID
Language of text:
English