Chavarin, Carlos Alvarado; Sagade, Abhay A.; Neumaier, Daniel; Bacher, Gerd; Mertin, Wolfgang:
On the origin of contact resistances in graphene devices fabricated by optical lithography
In: Applied Physics A : Materials Science and Processing, Vol. 122 (2016), No. 2, p. 58
2016article/chapter in journal
Electrical Engineering and Information TechnologyFaculty of Engineering » Engineering and Information Technology » Electronic Materials and NanostructuresScientific institutes » Center for Nanointegration Duisburg-Essen (CENIDE)
Title in English:
On the origin of contact resistances in graphene devices fabricated by optical lithography
Author:
Chavarin, Carlos Alvarado;Sagade, Abhay A.;Neumaier, Daniel;Bacher, GerdUDE
GND
110666038
LSF ID
3929
ORCID
0000-0001-8419-2158ORCID iD
Other
connected with university
;
Mertin, WolfgangUDE
GND
1256879886
LSF ID
1452
ORCID
0000-0001-6792-6033ORCID iD
Other
connected with university
Year of publication:
2016
Web of Science ID
Scopus ID
Language of text:
English