Dippel, Olaf; Wright, Steven; Hasselbrink, Eckart:
Photochemical routes to silicon epitaxy
In: Journal of Vacuum Science and Technology A : Vacuum, Surfaces, and Films, Vol. 15 (1997), No. 3, pp. 1135 - 1139
1997article/chapter in journal
ChemistryFaculty of Chemistry » Physikalische Chemie
Title in English:
Photochemical routes to silicon epitaxy
Author:
Dippel, Olaf;Wright, Steven;Hasselbrink, EckartUDE
GND
1162945346
LSF ID
11041
ORCID
0000-0002-9374-2868ORCID iD
Other
connected with university
Year of publication:
1997
DOI
10.1116/1.580443
Scopus ID
0345954982
Language of text:
English
Appears in
Journal of Vacuum Science and Technology A : Vacuum, Surfaces, and Films
Place of publication:
New York
Publisher:
American Vacuum Society (AVS)
in:
Vol. 15 (1997), No. 3, pp. 1135 - 1139
ISSN
0734-2101 Show availability online & print
ZDB ID
797704-9
Library shelfmark:
67 Z 23