Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride
In: Journal of Applied Physics, Vol. 90 (2001), No. 11, pp. 5825 - 5831
Title in English:
Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride
Author:
Harris, H.;Biswas, N.;Temkin, H.;Gangopadhyay, S.;Strathmann, MartinUDE
- LSF ID
- 14744
- Other
- connected with university
Year of publication:
2001
Language of text:
English
Appears in
Title in English (abbreviated):
J Appl Phys
Place of publication:
College Park
Publisher:
American Institute of Physics (AIP)
in:
Vol. 90 (2001), No. 11, pp. 5825 - 5831
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ISSN
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