Exploring magnetic roughness in CoFe thin films

Freeland, J. W.; Chakarian, V.; Bussmann, K.; Idzerda, Y. U.; Wende, Heiko; Kao, C. C.:

In: Journal of Applied Physics, Vol. 83 (1998), No. 11, pp. 6290 - 6292

1998article/chapter in journal

Physics (incl. Astronomy)

Title in English:

Exploring magnetic roughness in CoFe thin films

Author:

Freeland, J. W.;Chakarian, V.;Bussmann, K.;Idzerda, Y. U.;Wende, Heiko^UDE;Kao, C. C.

Year of publication:

1998

DOI

Language of text:

English

Appears in

Title in English (abbreviated):

J Appl Phys

Place of publication:

College Park

Publisher:

American Institute of Physics (AIP)

in:

Vol. 83 (1998), No. 11, pp. 6290 - 6292

ISSN

ISSN

ZDB ID

Library shelfmark:

University bibliography