Hartmann, Nils; Franzka, Steffen; Koch, J; Ostendorf, A; Chichkov, B. N.:
Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses
In: Applied Physics Letters (APL), Vol. 92 (2008), p. 223111
2008article/chapter in journal
ChemistryScientific institutes » Center for Nanointegration Duisburg-Essen (CENIDE)
Related: 1 publication(s)
Title in English:
Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses
Author:
Hartmann, NilsUDE
GND
115540466
LSF ID
11099
ORCID
0000-0001-6804-514XORCID iD
Other
connected with university
;Franzka, SteffenUDE
LSF ID
11103
Other
connected with university
;Koch, J;Ostendorf, A;Chichkov, B. N.
Year of publication:
2008
DOI
10.1063/1.2939585
Language of text:
English
Appears in
Applied Physics Letters (APL)
Title in English (abbreviated):
Appl Phys Lett
Title in English (alternative):
Applied physics letters online
Place of publication:
College Park
Publisher:
American Institute of Physics (AIP)
in:
Vol. 92 (2008), p. 223111
ISSN
0003-6951 Show availability online & print
ISSN
1077-3118 Show availability online & print
ZDB ID
1469436-0